CMP Slurries-Manufacturing Process, Technology, Products, Applications, Market Reports and Manufacturing Companies

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Polishing and planarization are related in that polishing improves the flatness (planarity), smoothness and optical properties of a surface. The chemicals in the slurry react with and/or weaken the material to be removed. The abrasive accelerates this weakening process and the polishing pad helps to wipe the reacted materials from the surface. Chemical mechanical planarization (CMP) is used during the semiconductor manufacturing process to planarize individual layers in complex integrated circuits to customer-specific parameters. CMP is a critical technology in the planarization of multilevel metallization systems and in shallow trench isolations (STIs) in semiconductor manufacturing.. The technology of CMP is well established in the back-end of IC manufacturing, where it was developed to remove variations (bumps) in metallization layers of multi-layer PCB. The shift to smaller CDs and the adoption of new technologies such as low-k dielectric materials and copper interconnect has increased the specifications and challenges for a smooth planar wafer surface. The market for CMP equipment alone will reach almost $1 billion dollars in 2006. CMP slurry and CMP pad markets have also grown substantially in the last five years.
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General Chemical-Mechanical Planarization Chemical Mechanical Polishing (CMP) CMP Slurries Characterization Modeling Planarization CMP Polishing Pad Effects Manufacturing Process CMP Process Crystec Technology- CMP Process Automated CMP Process CMP Slurry In-Line Process Monitor Handling and Filtration of Colloidal Silica CMP Slurries Hydrogen Peroxide Measurement in Semiconductor Manufacturing and CMP Processes Tungsten CMP Process Utilizing a Hard Porous Polishing Pad Planarization Process Defect Classification Making CMP Work Development and Implementation of 300mm Cu CMP Manufacturing Systems POU Filtration of Silica-Based CMP Slurries Preparations of Silica Slurry CMP for Computer Chip Manufacturing Technology Semiconductor Manufacturing Technology Hitachi Chemical Metal CMP Slurry CMP Market And Technology Status Tutorial on Chemical Mechanical Polishing (CMP) CMP Slurry Polishing Technologies for Planarised Multi-layer Structures CMP Slurry Polishing Technologies for Planarised Multi-layer Structures CMP Tribo-Metrology Cryogenic Cleaning Cu CMP Technology Improved Chemical Mechanical Planarization Pads Cu-CMP for Dual Damascene Technology Full Profile Inter-layer Dielectric CMP Analysis Endpoint Detection in Chemical Mechanical Planarization Using Acoustic Emission Oxide Polishing Solid State Technology Division of Industrial and Engineering Chemistry-India Status Global Outlook for CMP Technology and Materials CMP Slurry Composition- US Patent United States Patent Class 257/E21.304 By CMP(EPO) About CMP Slurry Patents	Products and Design ATDF Wafer Services-CMP Products Wafer-Scale Chemical Mechanical Planarization Models CMP R&D System Dongjin-CMP Slurries Slurry Blending and Distribution System Pressure Measurement for CMP Filtration Systems Slurry Design for Chemical Mechanical Polishing Equipments Needed Chemical Mechanical Polishing(CMP) Slurry Feeder Equipment Wet Process Equipment Applications CMP Application Shallow Trench Isolation CMP and Wastewater Treatment Monitoring and Safety CMP Slurry Continuous Monitoring and Control Online Monitoring of CMP Slurries CMP Supply Systems Safety Market Reports and Future Forecast Cabot-Stockholders Annual Meeting 2006 Cabot Microelectronics-Annual Report 2005 Fujifilm Annual Report 2006 IEEE International Interconnect Technology Conference-2005 Global CMP Market to Reach Nearly $3.3 Billion By 2008 Sinmat Chemical Mechanical Polishing Equipment and Materials- Market Analysis Taiwan Market Forecast for Electronic Chemicals Manufacturing Companies Slurry Distribution DuPont AirProducts NanoMaterials MFI™ for CMP Slurry Outlier Analysis DuPont- Fabrication Materials Rohm and Haas Expands Delaware Slurry Manufacturing Operations Cabot Microelectronics Completes New North America Slurry Manufacturing Facility Hitachi in North America-Group Companies and Affiliates Samsung Company Profile Website of Membrane Manufacturers Order the CD ROM Today
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